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"Diffraction efficiency"

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"Diffraction efficiency"

Holographic Properties in Amorphous As-Ge-Se-S with Ag Thickness
Chung Hyeok Kim
J Korean Inst Electr Electron Mater Eng 2012;25(3):213-217.   Published online March 1, 2012
DOI: https://doi.org/10.4313/JKEM.2012.25.3.213
In this study, we have investigated the holographic grating formation on Ag-doped amorphous As-Ge-Se-S thin films. The dependence of diffraction efficiency as afunction of Ag layer thickness has been investigated in this amorphous chalcogenide films. Holographic gratings was formed using [P:P] polarized Diode Pumped Solid State laser (DPSS, 532.0 nm). The diffraction efficiency was obtained by +1st order intensity. The results were shown that the diffraction efficiency of Ag/AsGeSeS double layer thin films for the Ag thickness, the maximum grating diffraction efficiency using 60 nm Ag layer is 0.96%.
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Diffraction Efficiency Properties of Holographic Gratings by the Reversal Bleached on the Effect of Superadditivity
Chun Woo Lim
J Korean Inst Electr Electron Mater Eng 2010;23(5):403-407.   Published online May 1, 2010
DOI: https://doi.org/10.4313/JKEM.2010.23.5.403
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Display,Optical Devices : Annealing Effect of the Chalcogenide Thin Film for Holographic Grating Formation
Jeong Il Park, Gyeong Sin, Jeong Tae Lee, Yeong Jong Lee, Hong Bae Jeong
J Korean Inst Electr Electron Mater Eng 2003;16(8):736-739.   Published online August 1, 2003
DOI: https://doi.org/10.4313/JKEM.2003.16.8.736
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Optical Devices : The Properties of Diffraction Efficiency in Polarization Holography using the Ag and MgF2/AsGeSeS Multi-layer
Sun Woong Na, Cheol Ho Yeo, Jong Bin Kim, Hong Bay Chung
J Korean Inst Electr Electron Mater Eng 2002;15(12):1070-1074.   Published online December 1, 2002
DOI: https://doi.org/10.4313/JKEM.2002.15.12.1070
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