In this study, a method to measure the thickness of thin film by EDS (energy dispersive spectroscopy) is suggested. We have developed a model which calculates the thickness of thin film from the characteristic x-ray intensity ratio of the elements in thin film and substrate by considering incident electron beam energy, x-ray generation curve, backscattering and absorption of x-ray, take-off angle of x-ray and tilt angle of the sample. We obtained the relation curve between the film thickness measured experimentally and the x-ray intensity ratio of elements. The film thicknesses calculated from the model agrees quite well with those measured experimentally. Therefore, the thin film thickness can be measured rapidly and accurately by using the model developed in this study and the x-ray intensity ratio obtained in EDS analysis.

Citations

• Contact Resistance between Flexible Tactile Sensor Fabricated by Direct Write and Copper Alloy Terminals
  Jindong Kim, Yonghwan Bae, Haeyong Yun, Inhwan Lee, Hochan Kim
  Journal of the Korean Society of Manufacturing Process Engineers.2020; 19(10): 111.     CrossRef
• Thickness Measurement of Ni Thin Film Using Dispersion Characteristics of a Surface Acoustic Wave
  Tae-Sung Park, Dong-Ryul Kwak, Ik-Keun Park, Miso Kim, Seung-Seok Lee
  Journal of the Korean Society for Nondestructive Testing.2014; 34(2): 171.     CrossRef