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  • Effect of CH4 addition to the H2O Plasma Excited by HF ICP for H2 Production
    Dae Woon Kim, Yong Ho Jung, Won Il Choo, Soo Ouk Jang, Bong Ju Lee, Young Ho Kim, Seung Heun Lee, Sung Ku Kwon
    Journal of Korean Institute of Electrical and Electronic Materials Engineers.2009; 22(5): 448.     CrossRef
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