Using facing target magnetron sputtering (FTMS) with a graphite target source, carbon nitride thin films were deposited on silicon and glass substrates at different substrate temperatures to confirm the tribological, electrical, and structural properties of thin films. The substrate temperatures were room temperature, 150℃, and 300℃. The tribology and electrical properties of the carbon nitride thin films were measured as the substrate temperature increased, and a study on the relation between these results and structural properties was conducted. The results show that the increase in the substrate temperature during the fabrication of the carbon nitride thin films increased the hardness and elastic modulus values, the critical load value was increased, and the residual stress value was reduced. Moreover, the increase in the substrate temperature during thin-film deposition was attributed to the improvement in the electrical properties of carbon nitride thin film.
Optical, mechanical and etch properties of amorphous carbon nitride films grown by plasma enhanced chemical vapor deposition at room temperature Sang Hoon Kim, Cheol Min Choi, Kil Mok Lee, Yoon-Bong Hahn Synthetic Metals.2010; 160(23-24): 2442. CrossRef
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