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"CMP (chemical mechanical polishing)"

Role of Oxidants for Metal CMP Applications
Yong Jin Seo, Sang Yong Kim, U Seon Lee
J Korean Inst Electr Electron Mater Eng 2004;17(4):378-383.   Published online April 1, 2004
DOI: https://doi.org/10.4313/JKEM.2004.17.4.378
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