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Break-In
WHERE t1.sid in(parameter_dbtbl_keyword '%Break-In%') and t1.xml_status <> 99
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Break-in (2)
CMP (2)
Conditioning (2)
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Chemical mechanical planarization (1)
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2007 (2)
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"Break-In"
Stability and Improvement of Polishing Pad in W CMP
J Electr Electron Mater
2007;20(12):1027-1033.
Published online December 1, 2007
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Polishing Pad Analysis and Improvement to Control Performance
J Electr Electron Mater
2007;20(10):839-845.
Published online October 1, 2007
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