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"Bi2Te3"

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"Bi2Te3"

Doping Effects to the Thermoelectric Power Factor of Bi2Te3 Thin Films
Sang Hyun Bae, Soon-mok Choi
J Korean Inst Electr Electron Mater Eng 2020;33(2):141-146.   Published online March 1, 2020
DOI: https://doi.org/10.4313/JKEM.2021.33.2.12
Thermoelectric Bi2Te3 thin films were synthesized by a co-sputtering method at 300℃. A Fe dopant was considered to enhance the thermoelectric properties of the system. The Seebeck coefficient of the Fe-doped films increased whereas the electrical conductivity decreased. As a result, the power factor of the system increased owing to the enhanced Seebeck coefficient. Grain growth inhibition was detected in the Fe-doped system, which produced more grain boundaries in the Fe-doped films than in the undoped system. The increased grain boundary scattering was deemed to be effective for a reduced thermal conductivity. This is advantageous for the preparation of high-performance thermoelectric films.
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Regular Paper The Effect of Sintering on the Thermoelectric Properties of Bulk Nanostructured Bismuth Telluride (Bi2Te3)
Susanna Yu, Min Seok Kang, Do Kyung Kim, Kyung Sook Moon, M. S. Toprak, Sang Mo Koo
J Korean Inst Electr Electron Mater Eng 2014;27(9):561-565.   Published online September 1, 2014
DOI: https://doi.org/10.4313/JKEM.2014.27.9.561
Thermoelectric materials have been the topic of intensive research due to their unique dual capability of directly converting heat into electricity or electrical power into cooling or heating. Bismuth telluride (Bi2Te3) is the best-known commercially used thermoelectric material in the bulk form for cooling and power generation applications In this work we focus on the large scale synthesis of nanostructured undoped bulk nanostructured Bi2Te3 materials by employing a novel bottom-up solution-based chemical approach. Spark plasma sintering has been employed for compaction and sintering of Bi2Te3 nanopowders, resulting in relative density of g·cm-3 while preserving the nanostructure. The average grain size of the final compacts was obtained as 200 nm after sintering. An improved NS bulkundoped Bi2Te3 is achieved with sintered at 400℃ for 4 min holding time.
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Regular Paper : Thermoelectric Properties of Bi2Te3 Films Grown by Modified MOCVD with Substrate Temperatures
Hyun Woo You, O Jong Kwon, Kwang Chon Kim, Won Chel Choi, Chan Park, Jin Sang Kim
J Korean Inst Electr Electron Mater Eng 2011;24(4):340-344.   Published online April 1, 2011
DOI: https://doi.org/10.4313/JKEM.2011.24.4.340
Thermoelectric bismuth telluride (Bi2Te3) films were deposited on 4° off oriented (001) GaAs substrates using a modified metal organic chemical vapor deposition (MOCVD) system. The effects of substrate temperature on surface morphologies, crystallinity, electrical properties and thermoelctric properties were investigated. Two dimensional growth mode (2D) was observed at substrate temperature lower than 400℃. However, three dimensional growth mode (3D) was observed at substrate temperature higher than 400℃. Change of growth mechanism from 2D to 3D was confirmed with environmental scanning electron microscope (E-SEM) and X-ray diffraction analysis. Seebeck coefficients of all samples have negative values. This result indicates that Bi2Te3 films grown by modified MOCVD are n-type. The maximum value of Seebeck coefficient was -225 μV/K and the power factor was 1.86×10-3 W/mK2 at the substrate temperature of 400℃. Bi2Te3 films deposited using modified MOCVD can be used to fabricate high-performance thermoelectric devices.
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Energy Materials : Microstructures and Thermal Properties of Water Quenched Thermoelectric Material in Bi2Te3-PbTe System
Ju Hyuk Yim, Kyoo Ho Jung, Hyun Woo You, Kwang Chon Kim, Jin Sang Kim
J Korean Inst Electr Electron Mater Eng 2010;23(6):502-507.   Published online June 1, 2010
DOI: https://doi.org/10.4313/JKEM.2010.23.6.502
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Energy Materials : Growth of Nano Structure Bi2Te3 Films using Modified MOCVD Technique
Hyun Woo You, Kyoo Ho Jung, Ju Hyuk Yim, Kwang Chon Kim, Chan Park, Jin Sang Kim
J Korean Inst Electr Electron Mater Eng 2010;23(6):497-501.   Published online June 1, 2010
DOI: https://doi.org/10.4313/JKEM.2010.23.6.497
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