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"BFO"

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"BFO"

Optimization of the P+ Region in SiC-Based MPS Diodes: Enhancing BFOM and Alleviating Snap-Back Phenomenon
Seung-hyun Park, Tae-hee Lee, Se-rim Park, Ju-eun Yun, Geon-hee Lee, Ji-hwan Jeon, Jong-min Oh, Weon Ho Shin, Sang-mo Koo
J Korean Inst Electr Electron Mater Eng 2024;37(6):675-679.   Published online November 1, 2024
DOI: https://doi.org/10.4313/JKEM.2024.37.6.15
Department of Electric Materials Engineering, Kwangwoon University, Seoul 01897, Korea (Received June 13, 2024; Revised July 8, 2024; Accepted July 10, 2024) Abstract: Wide bandgap (WBG) devices, especially SiC, are gaining traction as materials for high-power EV conversion devices due to their superior efficiency and switching capabilities compared to Si-based power devices. SiC allows for high power, high temperature, and high frequency applications because of its outstanding thermal conductivity, saturation velocity, and dielectric breakdown field. SiC-based MPS diodes combine the advantages of SiC-based SBDs and PiN diodes, allowing high-frequency switching operation with low leakage currents under high voltage conditions. However, MPS diodes exhibit snapback phenomena influenced by the P+ region’s size, necessitating optimization. A TCAD simulation studied the impact of the P+ region’s depth and width on MPS diode performance. Increasing the P+ width raised the On-specific resistance (Ron,sp) and lowered the maximum voltage during snapback (Vsnap). Increasing the depth decreased both Breakdown voltage (BV) and Vsnap. A trade-off between the semiconductor performance index BFOM and Vsnap was identified, leading to optimized dimensions. The optimized MPS diode shows a low Vsnap of about 3.89 V and a high BFOM of 1.72 GW·㎠, highlighting its potential as a next-generation high-performance power conversion device.
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Regular Paper : Thin Films and Sensors ; Structural and Electrical Properties of Sol-gel Derived BFO/PZT Thin Films with Variation of Solvents
Chang Hyun Cho, Ju Lee
J Korean Inst Electr Electron Mater Eng 2011;24(11):895-899.   Published online November 1, 2011
DOI: https://doi.org/10.4313/JKEM.2011.24.11.895
Multiferroic BFO/PZT(5/95) multilayer films were fabricated by spin-coating method on the Pt/Ti/SiO2/Si substrate alternately using BFO and PZT(9/95) alkoxide solutions. The structural and dielectric properties were investigated with variation of the solvent and the number of coatings. All films showed the typical XRD patterns of the perovskite polycrystalline structure without presence of the second phase such as Bi2Fe4O3. BFO/PZT multilayer thin films showed the typical dielectric relaxation properties with increase an applied frequency. The average thickness of 6-coated BFO/PZT multilayer film was about 600 nm. The dielectric properties such as dielectric constant, dielectric loss and remnant polarization were superior to those of single composition BFO film, and those values for BFO/PZT multilayer film were 1199, 0.23% and 12 μC/cm2.
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Regular Paper : Phase Evolution Behavior of (Bi,Nd)(Fe,Ti)O3 Ceramics and Thin Films
Kyung Man Kim, Hee Young Lee
J Korean Inst Electr Electron Mater Eng 2010;23(12):949-955.   Published online December 1, 2010
DOI: https://doi.org/10.4313/JKEM.2010.23.12.949
Nd and Ti co-doped bismuth ferrite (Bi1-xNdx)(Fe1-yTiy)O3 (x, y=0, 0.05, 0.1, 0.2) ceramics and thin films were synthesized through the conventional mixed-oxide process and pulsed laser deposition (PLD), respectively. Nd and Ti co-doping effect was examined with emphasis on how these impurities affect phase formation behavior as there could be the improvement in leakage current problems often associated with multiferroic BiFeO3 (BFO) thin films. The lattice constants of BFO ceramics decreased with Nd doping concentration up to 10mol%, while they further decreased with Nd and Ti co-doping to about 20%. BFO thin films obtained by the PLD process revealed random polycrystalline structure. Similar to bulk BFO ceramic, Nd and Ti co-doping effectively suppressed the formation of unwanted secondary phase and thus stabilized the perovskite phase in BFO thin films.
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