In the present study, the CuNx-Cu-CuNx layer the partial pressure ratio Cu metal of Ar and N2 gas using a DC magnetron sputtering device, was generated by the In-situ method. CuNx layer was able to obtain a surface reflectance reduction effect from the advantages of the process and the external light. CuNx layer is gas partial pressure, DC the Power, the deposition time variable transmittance in response to the thickness and partial pressure ratio, the reflectance was measured. Ar:N2 gas ratio 10:10(sccm), DC power 0.35 A, was derived Deposition time 90 sec optimum conditions. Thus, according to the optimal thickness and the composition ratio was derived surface reflectance of 20.75%. In addition, to derive the value of △ Ra surface roughness of 0.467. It was derived CuNx band-gap energy of about 2.2 eV. Thus, to ensure a thickness and process conditions can be absorbed to maximize the light in a wavelength band in the visible light region. As a result, the implementation of the 1.2 ㏀ base line resistance of using the Cu metal. This is, 5 inch Metal mesh TSP(L/S: 4/270 ㎛) is in the range of the reference operation.

AlNO multi-layer thin films on aluminum substrates were prepared by DC reactive magnetron sputtering method. Al2O3/AlNO(LMVF)/AlNO(HMVF)/Al/substrate of 4 multi-layer has been prepared in an Ar and (N2+O2) gas mixture, and Al2O3 of top layer is anti-reflection layer on double AlNO(LMVF)/AlNO(HMVF) layers and Al metal of infrared reflection layer. In this study, the roughness and surface properties of AlNO thin films were estimated by field emission scanning electron microscopy(FE-SEM). The grain size of AlNO thin films increased with increasing sputtering power. The composition of thin films has been systematically investigated using electron probe microanalysis(EPMA). The optical properties with wavelength spectrum were recorded by UV-Vis-NIR spectrophotometry at arange of 200～1,500 nm. The absorptance of AlNO films shows the increasing trend with swelling(N2+O2) gas mixture in HMVF and LMVF deposition. The excellent optical performance showed above98% of absorptance in visible wavelength region.

Porous carbon electrodes with wooden materials are manufactured by molding carbonized wood powder. Electrical properties of the interface for electrolyte and porous carbon electrode are investigated from viewpoint of NaCl electrolyte concentration, capacitance and complex impedance. Density of porous carbon materials is 0.47∼0.61 g/cm3. NaCl electrolytic absorptance of the porous carbon materials is 5∼ 30%. As the electrolyte concentration increased, capacitance is increased and electric resistance is decrease with electric double layer effect of the interface. The electric current of the porous carbon electrode compared in the copper and the high density carbon electrode was improved on a large scale, due to a increase in surface area. The circuit current increased as the distance between of the porous carbon electrode and the zinc electrode decreased, due to increase in electric field. Experimental results indicated that the current properties of galvanic cell could be improved by using porous carbon electrode.